| Autor: |
Vermeer, A.J.P.M., Roozeboom, F., Deelen, J. van |
| Jazyk: |
angličtina |
| Rok vydání: |
2017 |
| Předmět: |
|
| Popis: |
Method of depositing an atomic layer on a substrate. the method comprises supplying a precursor gas fraom a precursor-gas supply of a deposition head that may be part of a rotatable drum. The precursor gas is provided from the presursor-gas supply towards the substrate. The method further comprises moving the precursor-gas supply by rotating the deposition head along the substrate which in its turn is moved along the rotating drum. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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