Microstructure Related Characterization of a-Si:H Thin Films PECVD Deposited under Varied Hydrogen Dilution

Autor:	Vavruňková, Veronika, Müllerová, Jarmila, Šutta, Pavel
Jazyk:	angličtina
Rok vydání:	2007
Předmět:	si-h bonds genetic structures pecvd hydrogen sense organs Electrical engineering. Electronics. Nuclear engineering eye diseases TK1-9971
Zdroj:	Advances in Electrical and Electronic Engineering, Vol 6, Iss 3, Pp 108-111 (2007)
ISSN:	1804-3119 1336-1376
Popis:	We report on the structure and optical properties of hydrogenated silicon thin films deposited by plasma - enhanced chemical vapor deposition (PECVD) from silane diluted with hydrogen in a wide dilution range. The samples deposited with dilutions below 30 were detected as amorphous hydrogenated silicon (a-Si:H) with crystalline grains of several nanometers in size which represent the medium-range order of a-Si:H. The optical characterization confirmed increasing ordering with the increasing dilution. The optical band gap was observed to be increasing function of the dilution.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::434c38aa0b00562848388fc3bf60dfea http://advances.utc.sk/index.php/AEEE/article/view/164 Zobrazit plný text záznamu