Low temperature plasma deposition of microcrystalline silicon thin films for active matrix displays: Opportunities and challenges

Autor:	Roca I Cabarrocas, P., Abramov, A., Pham, N., Djeridane, Y., Moustapha, O., yvan bonnassieux, Kunal, G., Hong, C., Seungkyu, P., Kyongtae, P., Huh, J. -M, Joonhoo, C., Chiwoo, K., Jinseok, L., Jun, H. S.
Zdroj:	Scopus-Elsevier
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::35811c1447ba48a5311830fc7706cb88 http://www.scopus.com/inward/record.url?eid=2-s2.0-65649135403&partnerID=MN8TOARS Zobrazit plný text záznamu