Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

Autor:	Boher, Pierre, Piel, Jean-Philippe, Defranoux, Christophe, Stehle, Jean-Louis, Hennet, Louis
Přispěvatelé:	SOPRA, Laboratoire de Métallurgie Physique et Science des Matériaux (URA CNRS 155) (LMPSM), Université Henri Poincaré - Nancy 1 (UHP)-Centre National de la Recherche Scientifique (CNRS)
Jazyk:	angličtina
Rok vydání:	1996
Předmět:	[PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci] ComputingMilieux_MISCELLANEOUS
Zdroj:	SPIE's 1996 International Symposium on Microlithography SPIE's 1996 International Symposium on Microlithography, Mar 1996, Santa Clara, United States. pp.608-620, ⟨10.1117/12.240988⟩
DOI:	10.1117/12.240988⟩
Popis:	International audience
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::2fc912cb2176945c737e9ef913866ec6 https://hal.archives-ouvertes.fr/hal-02540731 Zobrazit plný text záznamu