Interaction of O and H atoms with low-k SiOCH films pretreated in He plasma

Autor:	Braginsky, O. V., Kovalev, A. S., Lopaev, D. V., Mankelevich, Y. A., Malykhin, E. M., Proshina, O. V., Rakhimova, T. V., Rakhimov, A. T., Vasilieva, A. N., Dmitry Voloshin, Zyryanov, S. M., Baklanov, M. R.
Zdroj:	Scopus-Elsevier
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::2d1f7610c11b8cc7f3f7fff703fdea46 http://www.scopus.com/inward/record.url?eid=2-s2.0-77649097221&partnerID=MN8TOARS Zobrazit plný text záznamu