Dry friction behaviour of SiCx(H) (1,5 < x < 3) coatings obtained by microwave PACVD

Autor: Boher , Christine, Ducarroir , M, Gregoire , T, Scordo , S
Přispěvatelé: Centre Matériaux - Ecole des Mines Albi-Carmaux, IMT École nationale supérieure des Mines d'Albi-Carmaux ( IMT Mines Albi ), 92000 Suresnes
Jazyk: angličtina
Rok vydání: 1998
Předmět:
Zdroj: Annales de Chimie-Science des Matériaux
Annales de Chimie-Science des Matériaux, Lavoisier, 1998, 23 (5-6), pp.879-890. 〈10.1016/S0151-9107(99)80028-2〉
ISSN: 0151-9107
1958-5934
DOI: 10.1016/S0151-9107(99)80028-2〉
Popis: Meeting of Annales-de-Chimie-Science-des-Materiaux on Hard and Adherent Coatings by Chemical Vapour Deposition, PERPIGNAN, FRANCE, SEP 09-11, 1998; International audience; Thin coatings in the Si-C system were obtained in a plasma device actived by microwave. Their chemical composition and mechanical properties are dependent on the deposition parameters like temperature and gas flow rate in the reactor. When the substrate temperature increases the stationnary dry friction coefficient is lower than 0.1 and the wear scar is smooth. In this case surface analyses reveal an interfacial layer on the antagonist which participates to the good tribological behaviour. With a hydrogen flow in the reactor, the coating flaked. The microstructure, the mechanical properties and the tribological behaviour are closely interdependent.
Databáze: OpenAIRE