Subsurface Ultrasonic Resonant Force Microscopy for Image-based Overlay Measurement

Autor: Tamer, M.S., Es, M.H. van, Sadeghian Marnani, H., Lans, M.J. van der
Jazyk: angličtina
Rok vydání: 2019
Předmět:
Zdroj: SID Semicon Innovation Day, Science Centre Delft, 21 May 2019
Popis: Scanning Probe Microscopy (SPM) has emerged as a metrology solution for the semiconductor industry enabling high throughput defect review and high resolution 3D metrology. TNO has developed a Subsurface Ultrasonic Resonant Force Microscopy (SSURFM) for non-destructive, high resolution imaging of features buried under one or more layers of material. Challenging targeted applications for this technique are overlay metrology and wafer alignment through optically opaque layers and overlay and alignment on product features, which requires device resolution. Using the TNO SSURFM technique, sub-surface measurements on two overlay and alignment targets have been performed. The goal of this study is to show the potential of the technique for Overlay/Alignment Applications.
Databáze: OpenAIRE