Fast‐writing E‐beam for defining large arrays of nano‐holes
| Autor: | Emil Højlund-Nielsen, Jeppe Sandvik Clausen, Alexander Bruun Christiansen, Tine Greibe, Asger Mortensen, N., Anders Kristensen |
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| Jazyk: | angličtina |
| Rok vydání: | 2013 |
| Předmět: | |
| Zdroj: | Højlund-Nielsen, E, Clausen, J S, Christiansen, A B, Greibe, T, Mortensen, N A & Kristensen, A 2013, Fast-writing E-beam for defining large arrays of nano-holes . in Proceedings of the 39th International Conference on Micro and Nano Engineering . 39th International Conference on Micro and Nano Engineering, London, United Kingdom, 16/09/2013 . Technical University of Denmark Orbit |
| Popis: | Efficient nanoscale patterning of large areas is required for sub-wavelength optics. For example, 200 nm periodic structures are often too small to be made with standard UV- and DUV-equipment. Still, the final product must be made at an economic cost. Here we use a fast-writing strategy described in [1], where electron beam lithography (EBL) with a focused Gaussian beam is used to define shapes directly. The serial technique is optimized for speed and pattern fidelity to a maximum writing speed of around 30 min/cm2 for 200 nm periods in 2D lattices. The overall costs in terms of machine time and feasibility are assessed for different topographies and dimensions. |
| Databáze: | OpenAIRE |
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