| Autor: |
Constantin Vahlas, Caussat, B., Senocq, F., Gladfelter, W. L., Sarantopoulos, C., Toro, D., Moersch, T. |
| Přispěvatelé: |
Institut National Polytechnique de Toulouse - Toulouse INP (FRANCE), Université Toulouse III - Paul Sabatier - UT3 (FRANCE), University of Minnesota (USA), Centre National de la Recherche Scientifique - CNRS (FRANCE) |
| Jazyk: |
angličtina |
| Rok vydání: |
2005 |
| Předmět: |
|
| Zdroj: |
Scopus-Elsevier |
| Popis: |
Chemical vapor deposition (CVD) using precursors that are solids at operating temperatures and pressures, presents challenges due to their relatively low vapor pressures. In addition, the sublimation rates of solid state precursors in fixed bed reactors vary with particle and bed morphology. In a recent patent application, the use of fluidized bed (FB) technology has been proposed to provide high, reliable, and reproducible flux of such precursors in CVD processes. In the present contribution, we first focus on the reactor design which must satisfy fluidization,sublimation and CVD reactor feeding constraints. Then, we report masstransport results on the sublimation of aluminium acetylacetonate, a common precursor for the CVD of alumina films. Finally, we discuss the efficiency of the precursor feeding rate, we address advantages and drawbacks of the invention and we propose design modifications in order to meet the process requirements. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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