High electron concentration and mobility in Al-doped n-ZnO epilayer achieved via dopant activation using rapid-thermal annealing

Autor: Kim, KK, Niki, S, Oh, JY, Song, JO, Seong, TY, Park, SJ, Fujita, S, Kim, SW
Jazyk: angličtina
Rok vydání: 2005
Zdroj: JOURNAL OF APPLIED PHYSICS. 97(6)
ISSN: 0021-8979
Popis: We report on the growth of very high-quality Al-doped n-type ZnO epilayers on sapphire substrates using a radio-frequency (rf) magnetron sputtering technique combined with a rapid-thermal annealing.Photoluminescence(PL) and Hall measurements show that both the optical and electrical properties of the ZnO layers are significantly improved with an increasing annealing temperature up to 900 °C. For example, the samples that are grown at 600 °C and a rf power of 100 W with an Ar/O2 gas ratio of 1 give an electron concentration of 1.83×10[20]cm3 and a mobility of 65.6cm2/Vs, when annealed at 900 °C for 3 min in a nitrogen ambient. Furthermore, x-ray diffraction measurements show that both the as-grown and annealed samples are of excellent crystallinity.
Databáze: OpenAIRE