Photolithographically Patterned Surface Modification of Poly(dimethylsiloxane) via UV-Initiated Graft Polymerization of Acrylates

Autor: Patrito, Natasha, McCague, Claire, Chiang, Swanda, R. Norton, Peter, O. Petersen, Nils
Zdroj: Langmuir; April 2006, Vol. 22 Issue: 8 p3453-3455, 3p
Abstrakt: Patterned surface modification of poly(dimethylsiloxane) (PDMS) is achieved by combining ultraviolet-initiated graft polymerization (UV-GP) and photolithography. Poly(acrylic acid) (PAA) and poly(methacrylic acid) (PMAA) patterns were grafted onto PDMS with micrometer-scale feature edge resolution. The morphology and chemical composition of the grafted layers were assessed by optical and atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and XPS imaging. AFM section analyses demonstrated the deposition of 33 ± 1 and 62 ± 8 nm thick patterned films of PAA and PMAA, respectively. Spatially resolved C 1s XPS provided images of carboxylic acid functionalities, verifying the patterned deposition of acrylate films on PDMS. These observations demonstrate the general usefulness of UV-GP and photolithography for micropatterning.
Databáze: Supplemental Index