| Autor: |
B, Sharmila, Dikshit, Ashutosh Kumar, Dwivedi, Priyanka |
| Zdroj: |
IEEE Transactions on Electron Devices; October 2024, Vol. 71 Issue: 10 p6185-6189, 5p |
| Abstrakt: |
Process scalability, reproducibility, and reliability are the key components for the semiconducting manufacturing industries for mass production of any devices. This article presents the impact of the synthesis process and microfabrication techniques on the photosensing devices performance metrics. The CMOS compatible standard wafer scale microfabrication techniques are used to fabricate the photosensing devices based on tungsten disulfide (WS2). The WS2 synthesis, device fabrication, and process scalability were verified by testing multiple devices from the processed silicon wafers. The optimized WS2-based photosensing device offers a responsivity and detectivity of 1.94 A/W and $3.3\times 10^{{11}}$ Jones at 950 nm, respectively. This optimized device has offered 38 times improved responsivity than the other tested devices. The optimized device has shown the rise/fall time of 81.5/ $79.9~\mu $ s at 950 nm. In addition, the stability test was performed by stimulating the device with different modulating frequencies. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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