| Autor: |
Voicu, R., Boukherroub, R., Bartzoka, V., Ward, T., Wojtyk, J. T. C., Wayner, D. D. M. |
| Zdroj: |
Langmuir; December 2004, Vol. 20 Issue: 26 p11713-11720, 8p |
| Abstrakt: |
This paper describes a simple strategy for DNA immobilization on chemically modified and patterned silicon surfaces. The photochemical modification of hydrogen-terminated Si(111) with undecylenic acid leads to the formation of an organic monolayer covalently attached to the surface through Si−C bonds without detectable reaction of the carboxylic acid group, providing indirect support of a free radical mechanism. Chemical activation of the acid function was achieved by a simple chemical route using N-hydroxysuccinimide (NHS) in the presence of N-ethyl-N-(3-dimethylaminopropyl) carbodiimide hydrochloride. Single strand DNA with a 5-dodecylamine group was then coupled to the NHS-activated surface by amide bond formation. Using a previously reported chemical patterning approach, we have shown that DNA can be immobilized on silicon surfaces in spatially well-resolved domains. Methoxytetraethyleneglycolamine was used to inhibit nonspecific adsorption. The resulting DNA-modified surfaces have shown good specificity and chemical and thermal stability under hybridization conditions. The sequential reactions on the surface were monitored by ATR-FTIR, X-ray Photoelectron Spectroscopy, and fluorescence spectroscopy. |
| Databáze: |
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