Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas
Autor: | Mohanty, Nihar, Altamirano-Sánchez, Efrain, Borges, Juliano, Yan, Hongwen, Koty, Devi, Rogalskyj, Sophia, Gignac, Lynne, Ocola, Leonidas, Hopstaken, Marinus, Molis, Steve, Simon, Andrew, Arnold, John, Shearer, Jeffrey, Bruce, Robert L. |
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Zdroj: | Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580E-129580E-7, 1166228p |
Databáze: | Supplemental Index |
Externí odkaz: |