Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas

Autor: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Borges, Juliano, Yan, Hongwen, Koty, Devi, Rogalskyj, Sophia, Gignac, Lynne, Ocola, Leonidas, Hopstaken, Marinus, Molis, Steve, Simon, Andrew, Arnold, John, Shearer, Jeffrey, Bruce, Robert L.
Zdroj: Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580E-129580E-7, 1166228p
Databáze: Supplemental Index