Extreme UV self-aligned double patterning process optimization for BEOL interconnections on 3nm nodes and beyond
| Autor: | Mohanty, Nihar, Altamirano-Sánchez, Efrain, Montero, D., Buccheri, N., Lin, Q., Roy, S., Paolillo, S., Wu, C., Hermans, Y., Decoster, S., Baudemprez, B., Finoulst, J. F., Lazzarino, F., Park, S., Tokei, Z. |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580D-129580D-17, 12828438p |
| Databáze: | Supplemental Index |
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