Dry etch challenges for patterning middle-of-line (MOL) contact trench in monolithic CFET (complementary FET)
| Autor: | Mohanty, Nihar, Altamirano-Sánchez, Efrain, Sarkar, T., Radisic, D., Vega Gonzalez, V., Stiers, K., Sheng, C., Montero, D., Jenkins, H., Demand, M., Wang, P., Lazzarino, F., Horiguchi, N. |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12958 Issue: 1 p129580B-129580B-9, 1166230p |
| Databáze: | Supplemental Index |
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