Advanced pattern selection and coverage check for computational lithography
| Autor: | Guerrero, Douglas, Amblard, Gilles R., Bae, Keonwoo, Kim, Taekyum, Lee, Sanghwa, Kim, Bongkeun, Jeong, Seongtae, Tang, Jenny, Zhao, Qian, Zhao, Yiqiong, Choi, Chang-Il, Liang, Jiao, Schroeder, Uwe Paul, Simmons, Mark |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129571M-129571M-9, 1166149p |
| Databáze: | Supplemental Index |
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