Advanced EUV CAR small molecule compounds design and its impact to etch performance

Autor: Guerrero, Douglas, Amblard, Gilles R., Cen, Yinjie, Park, Jong Keun, Coley, Suzanne M., Naab-Rafael, Benjamin D., Cui, Li, Aqad, Emad, Alexandrescu, Stefan, Rena, Rochelle, Eckert, Sylvie, Behnke, Jason, Lee, ChoongBong, Petrillo, Karen
Zdroj: Proceedings of SPIE; April 2024, Vol. 12957 Issue: 1 p129570A-129570A-7, 1166138p
Databáze: Supplemental Index