Optical diffraction-based methodology to measure on-product EUV exposure focus variations
| Autor: | Sendelbach, Matthew J., Schuch, Nivea G., op 't Root, Willem, Park, Jungwan, Nam, Youngsun, Kim, Seho, Hwang, Hyunwoo, Kong, Jeong Heung, Yun, Sang-Ho, Kang, Youngseog, Klaassen, Bram, van den Bos, Karel, Hou, Zhe, Soco, Aileen, Cheon, Don, Yim, Jong-Hyuk, Song, Hong-seung, Baek, Mi-Yeon |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12955 Issue: 1 p129552Q-129552Q-13, 12825662p |
| Databáze: | Supplemental Index |
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