A deep learning workflow to generate free-form masks for grayscale lithography
Autor: | Lafferty, Neal V., Grunes, Harsha, Moreau, Merlin, Henry, Jean-Baptiste, Bonnet, Stéphane |
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Zdroj: | Proceedings of SPIE; April 2024, Vol. 12954 Issue: 1 p129540Y-129540Y-17, 12824478p |
Databáze: | Supplemental Index |
Externí odkaz: |