A deep learning workflow to generate free-form masks for grayscale lithography

Autor: Lafferty, Neal V., Grunes, Harsha, Moreau, Merlin, Henry, Jean-Baptiste, Bonnet, Stéphane
Zdroj: Proceedings of SPIE; April 2024, Vol. 12954 Issue: 1 p129540Y-129540Y-17, 12824478p
Databáze: Supplemental Index