High accuracy OPC electromagnetic full-chip modeling for curvilinear mask OPC and ILT

Autor: Lafferty, Neal V., Grunes, Harsha, Sakr, Enas, Levinson, Zac, DeLancey, Rob, Lee, C. Jay, Li, Jinguang, Chen, Ryan, Iwanow, Robert, Yang, Delian, Hoppe, Wolfgang, Latinwo, Folarin, Lucas, Kevin, Liu, Peng
Zdroj: Proceedings of SPIE; April 2024, Vol. 12954 Issue: 1 p129540N-129540N-9, 1165870p
Databáze: Supplemental Index