High accuracy OPC electromagnetic full-chip modeling for curvilinear mask OPC and ILT
Autor: | Lafferty, Neal V., Grunes, Harsha, Sakr, Enas, Levinson, Zac, DeLancey, Rob, Lee, C. Jay, Li, Jinguang, Chen, Ryan, Iwanow, Robert, Yang, Delian, Hoppe, Wolfgang, Latinwo, Folarin, Lucas, Kevin, Liu, Peng |
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Zdroj: | Proceedings of SPIE; April 2024, Vol. 12954 Issue: 1 p129540N-129540N-9, 1165870p |
Databáze: | Supplemental Index |
Externí odkaz: |