Nanoimprint lithography performance advances for new application spaces
| Autor: | Liddle, J. Alexander, Ruiz, Ricardo, Ifuku, Toshihiro, Yonekawa, Masami, Nakagawa, Kazuki, Sato, Kazuhiro, Saito, Tomohiro, Aihara, Sentaro, Ito, Toshiki, Yamamoto, Kiyohito, Hiura, Mitsuru, Sakai, Keita, Takabayashi, Yukio |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12956 Issue: 1 p1295603-1295603-16 |
| Databáze: | Supplemental Index |
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