Advanced EUV patterning of 2D TMDs for CMOS integration

Autor: Liddle, J. Alexander, Ruiz, Ricardo, Faramarzi, Vina, de Poortere, Etienne, Parayil Venugopalan, Syam, Woltgens, Pieter, Woo, Youngtag, van de Kerkhof, Mark, Kumar, Pawan, Medina Silva, Henry, Morin, Pierre, Asselberghs, Inge, Dorow, Chelsey, O'Brien, Kevin, Maxey, Kirby, Avci, Uygar
Zdroj: Proceedings of SPIE; April 2024, Vol. 12956 Issue: 1 p129560I-129560I-9, 1166050p
Databáze: Supplemental Index