EUV lithography: LER design, mask, and wafer impact
| Autor: | Burkhardt, Martin, van Lare, Claire, Wang, Jiahui, Gallagher, Emily, Van de Kerkhove, Jeroen, Jonckheere, Rik, Trivkovic, Darko |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12953 Issue: 1 p129530A-129530A-7, 1165778p |
| Databáze: | Supplemental Index |
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