Focus sensing using placement and CD variation for high NA EUV lithography
| Autor: | Burkhardt, Martin, van Lare, Claire, Calado, Victor, Mathijssen, Simon, van Setten, Eelco, Finders, Jo, Wittebrood, Friso, Bouman, Wim, Bhattacharyya, Kaustuve, op 't Root, Willem, McNamara, Elliott, McLaren, Matthew |
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| Zdroj: | Proceedings of SPIE; April 2024, Vol. 12953 Issue: 1 p1295307-1295307-8 |
| Databáze: | Supplemental Index |
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