GMC: a negative acting resist used in the fabrication of chromium photomasks
| Autor: | Novembre, A. E., Kowalski, L. M., Frackoviak, J., Mixon, D. A., Thompson, L. F. |
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| Zdroj: | Proceedings of SPIE; October 2023, Vol. 12811 Issue: 1 p1281108-1281108-17 |
| Databáze: | Supplemental Index |
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