Realizing EUV photomask defectivity qualification by actinic mask review system
| Autor: | Liang, Ted, Kim, Seong-Sue, Lu, Jiun-Lung, Lu, Chien-Hsing, Tseng, Hsin-Fu, Wen, Vincent C. W., Chen, Chun-Hung, Huang, Yi-An, Chang, Yung-Sheng, Trivedi, Sagar V., Peng, Danping, Morisawa, Takayuki, Miyai, Hiroki |
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| Zdroj: | Proceedings of SPIE; November 2023, Vol. 12751 Issue: 1 p127510P-127510P-10, 12623501p |
| Databáze: | Supplemental Index |
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