Analysis method to define photoresist resolution in EUV lithography

Autor: Naulleau, Patrick P., Gargini, Paolo A., Itani, Toshiro, Ronse, Kurt G., Seo, Yongbeom, Go, Heeyoung, Lee, Jinseong, Oh, Taehwan, Shin, Donghun, Shin, Huiseob, Lee, Jisun, Kim, Sangjin, Kim, In-sung, Park, Changmin
Zdroj: Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500B-127500B-5, 1147506p
Databáze: Supplemental Index