Analysis method to define photoresist resolution in EUV lithography
Autor: | Naulleau, Patrick P., Gargini, Paolo A., Itani, Toshiro, Ronse, Kurt G., Seo, Yongbeom, Go, Heeyoung, Lee, Jinseong, Oh, Taehwan, Shin, Donghun, Shin, Huiseob, Lee, Jisun, Kim, Sangjin, Kim, In-sung, Park, Changmin |
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Zdroj: | Proceedings of SPIE; November 2023, Vol. 12750 Issue: 1 p127500B-127500B-5, 1147506p |
Databáze: | Supplemental Index |
Externí odkaz: |