A Quantitative Scale for the Structural Effect on Reactivity toward Nucleophilic Displacement at Silicon

Autor: Shimizu, Nobujiro, Takesue, Naohide, Yamamoto, Akiko, Tsutsumi, Toru, Yasuhara, Sigefumi, Tsuno, Yuho
Zdroj: Chemistry Letters; July 1992, Vol. 21 Issue: 7 p1263-1266, 4p
Abstrakt: The rates of solvolysis for forty different triorganochlorosilanes have been measured in 89 mol% aqueous dioxane at 25 °C; the logarithmic rates relative to that for trimethylchlorosilane, logkrel= log [kR1R2R3SiCl)/k(Me3SiCl)], provide a quantitative scale for the structural effect of various silyl groups on the reactivity toward nucleophilic displacement at silicon, ranging from 1.99 for HSiMe2to −6.89 for t-BuSiPh2groups.
Databáze: Supplemental Index