Actinic EUV mask qualification for next generation lithography
| Autor: | Behringer, Uwe F., Loeschner, Hans, Finders, Jo, Roesch, Matthias, Capelli, Renzo, Fischer, Lukas, Gwosch, Klaus, Kersteen, Grizelda, Mueller, Carolin, Nicholls, Robert, Verch, Andreas, Winkler, Alexander |
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| Zdroj: | Proceedings of SPIE; October 2023, Vol. 12802 Issue: 1 p128020L-128020L-7, 1152188p |
| Databáze: | Supplemental Index |
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