Exploring UV-Laser Effects on Al-Implanted 4H-SiC

Autor: Vivona, Marilena, Giannazzo, Filippo, Bellocchi, Gabriele, Panasci, Salvatore, Agnello, Simonpietro, Badalà, Paolo, Bassi, Anna, Bongiorno, Corrado, Di Franco, Salvatore, Rascunà, Simone, Roccaforte, Fabrizio
Zdroj: Diffusion and Defect Data Part B: Solid State Phenomena; May 2023, Vol. 342 Issue: 1 p85-89, 5p
Abstrakt: In this paper, we explore the effects of excimer laser irradiation on heavily Aluminum (Al)-implanted silicon carbide (4H-SiC) layer. 4H-SiC layers were exposed to UV-laser radiation (308 nm, 160 ns), at different laser fluences and the effects of the laser exposure surface were evaluated from morphological, micro-structural and nano-electrical standpoints. Depending on the irradiation condition, significant near-surface changes were observed. Moreover, the electrical characteristics of the implanted layer, evaluated by means of transmission line method, gave a sheet-resistance of 1.62×104 kW/sq for the irradiated layer, linked to a poor activation of the p-type dopant and/or a low mobility of the carriers in the laser-modified 4H-SiC layer. This study can be useful for a fundamental understanding of laser annealing treatments of 4H-SiC implanted layers.
Databáze: Supplemental Index