The damage control of sub layer while ion-driven etching with vertical carbon profile implemented

Autor: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Mun, SeungJin, Yoo, Lina, Hong, Jongdeok, Ahn, Junyeong, Jeon, Kyung-yub, Bai, Keunhee
Zdroj: Proceedings of SPIE; May 2023, Vol. 12499 Issue: 1 p124990J-124990J-5, 1124916p
Databáze: Supplemental Index