Evaluation of TiN hardmask films to prevent line wiggling due to plasma-induced film stress

Autor: Mohanty, Nihar, Altamirano-Sánchez, Efrain, Turnquist, A., Kofuji, N., Sebastian, J., Liu, Z., Kou, H., Fukuda, H., Tomczak, Y., Sun, Y., Piumi, D., Roest, D. D.
Zdroj: Proceedings of SPIE; May 2023, Vol. 12499 Issue: 1 p1249904-1249904-10
Databáze: Supplemental Index