Understanding etch properties of advanced chemically amplified EUV resist
| Autor: | Mohanty, Nihar, Altamirano-Sánchez, Efrain, Park, Jong Keun, Aqad, Emad, Cen, Yinjie, Coley, Suzanne M., Cui, Li, Hoelzel, Conner, Naab, Benjamin D., Lee, Choongbong, Rena, Rochelle, Kang, Philjae, Shin, You Rim, Limberg, David, Zhang, Lei |
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| Zdroj: | Proceedings of SPIE; May 2023, Vol. 12499 Issue: 1 p124990I-124990I-9, 1124920p |
| Databáze: | Supplemental Index |
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