Tracing optimized condition for electron beam metrology of EUV photoresist pattern using low-landing energy
| Autor: | Robinson, John C., Sendelbach, Matthew J., Jung, Woosung, Cho, Jong-Hoi, Lim, SungHun, Lee, TaeSeop, Choi, DaeYoung, Seo, Jong-Hyun, Lee, SeungHyun, Lee, JunKyoung, Kim, You Jin, Yeo, Jeong Ho, Brikker, Alex, Meir, Roi, Alkoken, Ran, Han, Kyeongju, Lim, Sujin, Choi, KyungJae, Kwak, Chanhee, Shin, Hyeon Sang |
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| Zdroj: | Proceedings of SPIE; April 2023, Vol. 12496 Issue: 1 p124963E-124963E-13, 12371351p |
| Databáze: | Supplemental Index |
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