Scaled-down deposited underlayers for EUV lithography
| Autor: | Guerrero, Douglas, Amblard, Gilles R., Gupta, Mihir, Antunes Afonso, Joao, Bezard, Philippe, Vallat, Remi, Fallica, Roberto, Suh, Hyo Seon, Halder, Sandip, De Simone, Danilo, Liu, Zecheng, Ran, Fanyong, Fukuda, Hideaki, Sun, Yiting, De Roest, David, Piumi, Daniele |
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| Zdroj: | Proceedings of SPIE; May 2023, Vol. 12498 Issue: 1 p124980R-124980R-6, 1124827p |
| Databáze: | Supplemental Index |
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