Investigation of plasma etching for interlayer dielectric planarization in high-efficiency deep-ultraviolet nanowire LEDs

Autor: von Freymann, Georg, Blasco, Eva, Chanda, Debashis, Melanson, Bryan, Seitz, Matthew, Zhang, Jing
Zdroj: Proceedings of SPIE; March 2023, Vol. 12433 Issue: 1 p124330H-124330H-8, 1118979p
Databáze: Supplemental Index