A neural network assisted etch model for mask process correction
| Autor: | Kasprowicz, Bryan S., Liang, Ted, Zuo, Zhiheng (Mary), Sharma, Rachit, Bork, Ingo, Mishra, Kushlendra |
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| Zdroj: | Proceedings of SPIE; December 2022, Vol. 12293 Issue: 1 p122930I-122930I-7, 1106378p |
| Databáze: | Supplemental Index |
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