Early defect detection for EUV self-aligned litho-etch litho-etch patterning with EPE
Autor: | Itani, Toshiro, Naulleau, Patrick P., Gargini, Paolo A., Ronse, Kurt G., Anunciado, Roy, Lee, Jisun, Barzegar, Ellaheh, van der Sanden, Stefan, Schelcher, Guillaume, Schoofs, Stijn |
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Zdroj: | Proceedings of SPIE; December 2022, Vol. 12292 Issue: 1 p122920J-122920J-8, 1106289p |
Databáze: | Supplemental Index |
Externí odkaz: |