In-line monitoring of overlay and process window using design-assisted voltage contrast inspection for 14nm FINFET technology
| Autor: | Robinson, John C., Sendelbach, Matthew J., Li, Runling, Hsu, I-Kai, Brozek, Tomasz, Yang, Linrong, He, Debiao, Wu, Fangrui, Ren, Jiadong, Zhu, Yefang, Zhang, Yan, Liu, Pei, Zhang, Haiqiong, Zhang, Guifeng, Fu, Yingying, Yin, Shan, Jia, Yujie, Yu, Bo |
|---|---|
| Zdroj: | Proceedings of SPIE; May 2022, Vol. 12053 Issue: 1 p120531U-120531U-7, 1084787p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|