Lowering the photoresist swing effect to increase the lithographic critical dimension uniformity: one step ahead in perfecting the dual Damascene module
| Autor: | Sanders, Daniel P., Guerrero, Douglas, Dall'Asta, Valentina, Litterio, Emma, Corneo, Nicoletta, Le-Gratiet, Bertrand, Bellunato, Tito Flavio |
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| Zdroj: | Proceedings of SPIE; July 2022, Vol. 12055 Issue: 1 p120550W-120550W-10, 11934461p |
| Databáze: | Supplemental Index |
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