Resist line edge roughness mitigation at high-NA EUVL

Autor: Sanders, Daniel P., Guerrero, Douglas, Ohtomi, Eisuke, Phillipsen, Vicky, Severi, Joren, Welling, Ulrich, Tanaka, Yusuke, De Simone, Danilo
Zdroj: Proceedings of SPIE; July 2022, Vol. 12055 Issue: 1 p120550K-120550K-8, 1084959p
Databáze: Supplemental Index