Design process integration enabling the productivity enhancement for nanoimprint lithography

Autor: Kim, Ryoung-Han, Lafferty, Neal V., Kobayashi, Sachiko, Mitsugi, Satoshi, Kodera, Katsuyoshi, Fukuhara, Kazuya, Mitra, Anupam, Ueha, Koki, Abe, Katsuya, Komori, Motofumi, Kanamitsu, Shingo, Kono, Takuya
Zdroj: Proceedings of SPIE; May 2022, Vol. 12052 Issue: 1 p1205208-1205208-8
Databáze: Supplemental Index