Design process integration enabling the productivity enhancement for nanoimprint lithography
Autor: | Kim, Ryoung-Han, Lafferty, Neal V., Kobayashi, Sachiko, Mitsugi, Satoshi, Kodera, Katsuyoshi, Fukuhara, Kazuya, Mitra, Anupam, Ueha, Koki, Abe, Katsuya, Komori, Motofumi, Kanamitsu, Shingo, Kono, Takuya |
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Zdroj: | Proceedings of SPIE; May 2022, Vol. 12052 Issue: 1 p1205208-1205208-8 |
Databáze: | Supplemental Index |
Externí odkaz: |