Pattern customization on 193 immersion lithography by negative tone development process and multiple exposures
| Autor: | Lio, Anna, Burkhardt, Martin, Mendes, Ivanie, May, Michael, Rêche, Jérôme, Tiron, Raluca, Sarrazin, Aurélien, Dubreuil, Olivier |
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| Zdroj: | Proceedings of SPIE; June 2022, Vol. 12051 Issue: 1 p120510Q-120510Q-8, 1084599p |
| Databáze: | Supplemental Index |
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