EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm
| Autor: | Lio, Anna, Burkhardt, Martin, Tan, Ling Ee, Gillijns, Werner, Lee, Jae Uk, Xu, Dongbo, van de Kerkhove, Jeroen, Philipsen, Vicky, Kim, Ryoung-Han |
|---|---|
| Zdroj: | Proceedings of SPIE; June 2022, Vol. 12051 Issue: 1 p120510P-120510P-18, 11930509p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|