Impact of mask variations on CD and placement in resist: local versus global effects

Autor: Lio, Anna, Burkhardt, Martin, Mernier, Guillaume, Palmen, Danielle, Schoumans, Nicole, van Veen, Marieke, Nielsen, Rasmus, Baselmans, Jan
Zdroj: Proceedings of SPIE; June 2022, Vol. 12051 Issue: 1 p1205104-1205104-10
Databáze: Supplemental Index