Impact of mask variations on CD and placement in resist: local versus global effects
Autor: | Lio, Anna, Burkhardt, Martin, Mernier, Guillaume, Palmen, Danielle, Schoumans, Nicole, van Veen, Marieke, Nielsen, Rasmus, Baselmans, Jan |
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Zdroj: | Proceedings of SPIE; June 2022, Vol. 12051 Issue: 1 p1205104-1205104-10 |
Databáze: | Supplemental Index |
Externí odkaz: |