Development of methods for the formation and control of a given distribution of the photoresist thickness for conformal correctors fabrication
| Autor: | Wang, Yongtian, Kidger, Tina E., Matoba, Osamu, Wu, Rengmao, Korolkov, Victor P., Nasyrov, Ruslan K., Khomutov, Vladimir N., Belousov, Dmitry A., Kutz, Roman I. |
|---|---|
| Zdroj: | Proceedings of SPIE; October 2021, Vol. 11895 Issue: 1 p118951J-118951J-6, 1070566p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|