| Autor: |
Garnier, Philippe, Audouin, Marine, Pizzetti, Christian, Loup, Virginie, Gabette, Laurence, Morote, Carlos, Dekraker, David, Schwab, Brent |
| Zdroj: |
Diffusion and Defect Data Part B: Solid State Phenomena; February 2021, Vol. 314 Issue: 1 p289-294, 6p |
| Abstrakt: |
During silicide formation, unreacted NiPt metals is traditionally removed either by aqua regia (ESH concern) or SPM. This latter can easily degrade the device yield in HKMG (High K Metal Gate) nodes if the metal gates (usually TiN based) aren’t perfectly encapsulated. First some new characterizations are presented to better understand the NiPt metal alloy removal, then a new solution is given to be able to remove this alloy without degrading HKMG materials. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
|
