Study of high throughput EUV mask pattern inspection technologies using multi e-Beam optics
| Autor: | Ando, Akihiko, Sugimori, Tadayuki, Ogawa, Riki, Takekoshi, Hidekazu, Hartley, John G., Pinckney, David J., Ando, Atsushi, Ishii, Koichi, Noda, Chosaku, Kikuiri, Nobutaka |
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| Zdroj: | Proceedings of SPIE; August 2021, Vol. 11908 Issue: 1 p119080J-119080J-9, 1071730p |
| Databáze: | Supplemental Index |
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