| Autor: |
Vogel, R., Dobe, C., Whittaker, A., Edwards, G., Riches, J. D., Harvey, M., Trau, M., Meredith, P. |
| Zdroj: |
Langmuir; March 2004, Vol. 20 Issue: 7 p2908-2914, 7p |
| Abstrakt: |
Mixed ammonia−water vapor postsynthesis treatment provides a simple and convenient method for stabilizing mesostructured silica films. X-ray diffraction, transmission electron microscopy, nitrogen adsorption/desorption, and solid-state NMR (13C, 29Si) were applied to study the effects of mixed ammonia−water vapor at 90 °C on the mesostructure of the films. An increased cross-linking of the silica network was observed. Subsequent calcination of the silica films was seen to cause a bimodal pore-size distribution, with an accompanying increase in the volume and surface area ratios of the primary (d = 3 nm) to secondary (d = 5−30 nm) pores. Additionally, mixed ammonia−water treatment was observed to cause a narrowing of the primary pore-size distribution. These findings have implications for thin film based applications and devices, such as sensors, membranes, or surfaces for heterogeneous catalysis. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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